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MSE Seminar: “Future Directions in Self-Assembly for Nanopatterning”
March 25, 2021 at 10:45 AM - 11:45 AM
Macromolecular self-assembly has evolved to become an important and valuable tool for bottom-up patterning and fabrication at the nanometer scale. From block copolymer lithography to nanocrystal superlattices to biomolecular assemblies, bottom-up patterning is reaching an unprecedent level of control over complex patterns at the nanoscale with an increasing degree of precision. There is no question that the lithographic landscape has been transformed in the past few years with the introduction of extreme ultraviolet (EUV) lithography and the maturity of multiple patterning techniques. At dimensions below 10 nm, emphasis is shifting away from resolution to precision, highlighting the importance of the uniformity achieved by block copolymers and the exquisite precision afforded by biomolecular assemblies. Moreover, an opportunity may be opening for new, higher complexity, information-rich architectures where hybrid nanoparticle-(bio)molecule assemblies may shine. With features defined at the molecular level and the potential to modular and hierarchical structures, self-assembly offers a path to highly uniform, 2D and 3D architectures. In this talk I will review the current state of bottom-up patterning with soft matter and I will discuss research plans at The Molecular Foundry related to molecular-scale assembly.
Staff Scientist, Lawrence Berkeley National Laboratory
Ricardo Ruiz is a staff scientist at Lawrence Berkeley National Laboratory where he uses Soft Matter Physics to solve nanofabrication challenges at the single-digit nm scale. From 2006 to 2019 he held various appointments at Hitachi GST/ HGST/ Western Digital where he contributed to magnetic bit patterned media and non-volatile memories, and he managed a research Group dedicated to block copolymer and nanoparticle lithography. He received his PhD in Physics from Vanderbilt University in 2003. He is a Fellow of the American Physical Society.